Tantalum nitride Sputtering Target TaN

Tantalum nitride Sputtering Target TaN

Goodwill Metal Tech manufactures Tantalum nitride Sputtering Target TaN. Our product is consistently good in quality and purity. We also makes doped targets by customer request.

Product Details

Tantalum mononitride is a chemical material with a formula of TaN and a molecular weight of 194.95


Tantalum nitride is a black hexagonal crystal. Relative density 13.4, melting point is 3090 ℃, microhardness is 1100 kg/was, thermal conductivity is 9.54 W/(m, K), the resistivity of 128 mu Ω · cm.
Partial tantalum nitride is yellowish green crystal, belongs to sodium chloride type crystal, the relative density is 15.6. Lattice constant is a=0.4336nm, c=0.4150nm. Melting point is 2950 ℃, microhardness is 3200 kg/was, inversion point temperature is 17.8 K.
Insoluble in water, acid, slightly soluble in aqua regia, dissolved in potassium hydroxide and decompose release ammonia, heated to 2000 ℃ or release nitrogen.

Product name

Tantalum nitride Sulphur target



Manfucture method



Max size 2000L×250W, Max Diameter 400mm .Special specification can be provided according to customer requirements




99.9% , 99.99% ,99.999%

Typical product

Grain size


Type of Bonding

RIndium         RElastomer        RSilver Adhesive    RAgCu



The material used to make the precise chip resistance is tantalum nitride resistant to water vapour erosion. In the process of manufacturing an integrated circuit, these membranes are deposited on the top of the silicon wafer to form a film surface attached to a resistor.

Quality Control 


1. Fully operate the computer information management system

The product status and production process can be checked at any time. The material coding, material shape, material location, equipment, operators, processing time and steps can be found through Lot No.

2. The operating procedures meet the requirements of ISO9001 quality system

The company implements scientific and strict management system, production process and operation procedure, and is strictly guaranteed from each link of product research and development, production and sales, and service.

3. All employees receive professional skills training and professional quality.

The company conducts regular assessment of employees' professional skills.


Hot Tags: Tantalum nitride Sputtering Target TaN, China, manufacturers, suppliers, factory, customized, price

Related Products