CuZnTiS4 Sputtering Target

CuZnTiS4 Sputtering Target

Goodwill Metal Tech manufactures CuZnTiS4 Sputtering Target. Our product is consistently good in quality and purity. We also makes doped targets by customer request.

Product Details


Beijing Goodwill Metal is a professional research and manufacture high-tech department of sputtering targets. We can provide sputtering targets with steady quality, diversified composition and specification serialization using hot isostatic pressing (HIP), cold isostatic pressing (CIP) ,hot processing (HP) and vacuum sintering processes. And we also offer combining targets and sputtering metal and bnding services according to customer require.


Specification


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Product name

Aluminum scandium sputtering target

Symbol

AlSc sputtering target

Manfucture method

HP(hot pressing), HIP(hot isostatic pressure),Smelting

Size

Max size 2000×250mm, Special specification can be provided according to customer requirements

Density

Metal>99% ,ceramic>85%   

Purity

99.9%-99.9999%

Typical product

AlSc30%

Grain size

100um

Type of Bond

RIndium         RElastomer        RSilver Adhesive


Application
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 Molybdenum niobium target

The molybdenum and niobium target materials produced by our company are produced by advanced hot isostatic pressure technology, and the products include plane target, arc target and tube target, etc., which have the advantages of high purity and density, uniform grain size and long service life.The typical proportion of molybdenum and niobium target is 90:10wt%, 95:5wt%, etc. Special composition and specification of target can also be customized according to customer requirements.


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