TiO2 Sputtering Targets

Goodwill Metal Tech manufactures TiO2 Sputtering Targets. Our product is consistently good in quality and purity. We also makes doped targets by customer request.

Product Details

Property


Property

Density

4 gcm-3

Microhardness (HV0.5)

880

Porosity

0%

Resistivity (25°C)

1012 ohm.cm

Modulus of Rupture

140MPa

Resistivity (700°C)

2.5x104 ohm.cm

Compressive Strength

680MPa

Dielectric Constant (1MHz)

85

Poisson’s Ratio

0.27

Dissipation factor (1MHz)

5x10-4

Fracture Toughness

3.2 Mpa.m-1/2

Dielectric strength

4 kVmm-1

Shear Modulus

90GPa

Thermal expansion (RT-1000°C)

9 x 10-6

Modulus of Elasticity

230GPa

Thermal Conductivity (25°C)

11.7 WmK-1Purity---99.9%,99.95%,99.99%

Refractive index --- 2.5-2.9

Shape--- Discs, Plate, Step (Dia ≤200mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤300mm, Width ≤200mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm )

Application ---For RF sputtering machane,used for High index film, multilayer interference filters.

Relation target--- SiO2 sputtering target.

Titanium Oxide Sputtering Targets (TiOx target) (For DC sputter)

Purity---99.9%,99.95%,99.99%

Shape--- Discs, Plate, Step (Dia ≤200mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤300mm, Width ≤200mm, Thickness ≥1mm)

Tube( Diameter< 300mm, Thickness >2mm )

Application ---For DC sputtering machane,used for high index film, multilayer interference filters.

Relation target --- SiO2 sputtering target...

Titanium Dioxide (TiO2) Evaporation Material  
Density--- rutile 4.26 g/cm3, brookite 4.17 g/cm3, anatase 3.84 g/cm3
Melting point ---1820℃±20℃,Vapour pressure at 1780℃ 1 Pa,at 1930℃ 10 Pa 
Solubility--- insoluble in water, sparingly soluble in sulphuric acid, sparingly soluble in alkalisLinear expansion coefficient ---9.19×10-6/K
Specific heat capacity--- 0.711 KJ/KgK
Hardness ---(acc. to Mohs) rutile 6 -- 6.5, anatase 5.5 -- 6(acc. to Knoop) rutile 879 Kg/mm2
Properties of thin film---
     Transmission range 400 ~ 12000nm
     Refractive index at 470nm ~2.4, at 550nm ~ 2.3, at 630nm ~ 2.2
     Structure Substrate temperature below 200℃: amorphous
     Substrate temperature above 300℃: rutile     Extremely hard and resistant when deposited onto hot substrates.
Hints on evaporation---
     Evaporation with electron-beam gun
     Substrate temperature 250~ 300 ℃
     Evaporation pressures 5×10-3 to 2×10-2Pa
     Rate of condensation about 10 ~ 20 nm/min
Purity--- 99.9%  Shape---solid substance, Black or white tablets ,3-8mm irregular pieces, flakes.Area---Highly refractive layers, Multi-layer for laser, mirrors, beam -splitters, heat reflecting mirrors, etc, 

Goodwill Can Customize Various Kinds Of Ceramic Sputtering Targets According To Customer's Requirement, Size Ratio Can Be Customized, Welcome To Consult.

Packaging & Shipping
Vacuum Packing .Cartons Packing .Wooden Case Packing .Standard Export Packing
Carrier :DHL,UPS,TNT,FedEx

Company Information
Goodwill Metal is belonged to China's the biggest material research institute-General Research Institute For NONFERROUS Metals.
We rigorous,efficient,and customer oriented.
We provide best products to the industrial for years.Also, we provide customized materials to laboratories and research institutes for their academic achievement.

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