TiN Sputtering Target

TiN Sputtering Target

Goodwill Metal Tech manufactures TiN Sputtering Target. Our product is consistently good in quality and purity. We also makes doped targets by customer request.

Product Details

IUPAC name:Titanium nitride

CAS Number:25583-20-4

ECHA InfoCard:100.042.819
EC Number:247-117-5
PubChem CID:93091

Chemical formula:TiN
Molar mass;61.874 g/mol
Appearance:Coating of golden color

Odor:Odorless

Density:5.22 g/cm3
Melting point:2,930 °C (5,310 °F; 3,200 K)
Solubility in water:insoluble
Magnetic susceptibility (χ):+38×10−6 emu/mol
Thermal conductivity: 19.2 W/(m·°C)

Crystal structure:Cubic, cF8
Space group:Fm3m, No. 225

Titanium Nitride (TiN)Sputtering Target

Purity ---99.5%

Shape --- Discs, Plate,Step (Dia ≤480mm,Thickness ≥1mm)

Rectangle, Sheet,Step (Length ≤360mm, Width ≤360mm, Thickness ≥1mm)

Tube( Diameter< 300mm,Thickness >2mm )

Application --- Titanium films are becoming more widely used as passivation layers for VLSI, decorative gold coatings, and wear coatings. A reactive sputtering process can deposit titanium nitride films with excellent electrical, mechanical, and optical properties.

Titanium Nitride (TiN) Evaporation Materials

Purity --- 99.5%

Shape --- Granule 1-3mm, 1-6mm, 2-6mm

Application---additive in cemented carbides, ceramic, spraying coating raw material...

Titanium Nitride (TiN) Powder

Purity --- 99.5%

Shape --- Powder,40-300mesh

Application --- additive in cemented carbides, ceramic, spraying coating raw material...

Titanium Nitride (TiN) Nanometer Powder

Purity---97% Oxygen content --- <1.0wt%

Color --- black Crystallographic form --- Cube Morphology---spherical

Average particle size (D50) --- <14nm

Specific surface area--- >80m2/g

Apparent density ---0.08g/cm3

Manufacture method --- Plasma arc vapor

Application ---Barrier layer in contact and interconnect metallizations, Bio-materials, Cutting tools, Forming tools, Gate electrode in metal-oxide-semiconductor (MOS) transistors, Low-barrier Schottky diode, Nanocomposites, Optical devices in aggressive, environments, Plastic molds, Prostheses, Surgical instruments, high temperatures crucibles and decorate materials, wear-resistant coating...

Relation Products:

Aluminum Nitride (AlN) Sputtering Targets;

Boron Nitride (BN) Sputtering Targets;

Chrominium Nitride (CrN) Sputtering Targets;

Gallium Nitride (GaN) Sputtering Targets;

Germanium Nitride (Ge3N4) Sputtering targets;

Hafnium Nitride (HfN) Sputtering Targets;

Magnesium Nitride (Mg2N3) Sputtering Targets;

Niobium Niride (NbN) Sputtering Targets;

Silicom Nitride (Si3N4) Sputtering Targets;

Tantalum Nitride (TaN) Sputtering Targets;

Titanium Carbonitride (TiCN) Sputtering targets;

Titanium Nitride(TiN) Sputtering Targets;

Vanadium Nitride (VN) Sputtering Targets;

Zirconium Nitride (ZrN) Sputtering Targets;

Packaging & Shipping
Vacuum Packing .Cartons Packing .Wooden Case Packing .Standard Export Packing
Carrier :DHL,UPS,TNT,FedEx

Company Information
Goodwill Metal is belonged to China's the biggest material research institute-General Research Institute For NONFERROUS Metals.
We rigorous,efficient,and customer oriented.
We provide best products to the industrial for years.Also, we provide customized materials to laboratories and research institutes for their academic achievement.

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