SiC Sputtering Target

SiC Sputtering Target

Goodwill Metal Tech manufactures SiC Sputtering Targets. Our product is consistently good in quality and purity. We also makes doped targets by customer request.

Product Details

Silicon Carbide (SiC) Sputtering Targets

Purity--- 99.3%, 99.9995%

Shape --- Discs, Plate, Step (Dia ≤300mm,, Thickness ≥1mm)

Rectangle, Sheet, Step (Length ≤600mm, Width ≤300mm, Thickness ≥2mm)

Silicon Carbide (SiC) Powder

Purity---95%, 97%, 98.5%, 99.3% 

Silicon Carbide Nanometer Powder (Beta SiC Powder) 

Purity---99%, Oxygen content --- <0.61wt%, Dissociate silicon content --- <0.20%

Color --- Green Morphology --- near spherical Crystallographic form --- Cubic

Average particle size (D50) --- <50nm

Specific surface area --- >90m2/g

Apparent density --- 3.22g/cm3 Apparent density --- 0.05g /cm3

Manufacture method --- Plasma arc vapor 

Application --- Potential Applications of SiC Nanopowders, Catalyst support, Nano-composites (e.g., Si3N4/SiC, SiC/polymer), Resistance heating elements, Strengthening materials for Al, Al2O3, Mg, and Ni, Superplasticity, Wall in future nuclear fusion reactors, Wear resistant parts

Relation Products

Boron Carbide(B4C) Sputtering Targets;

Chromium Carbide (Cr3C2) Sputtering Targets;

Hafnium Carbide(HfC) Sputtering Targets;

Iron Carbide (Fe3C) Sputtering Targets;

Molybdenum Carbide (Mo2C) Sputtering Targets;

Niobium Nitride (NbC) Sputtering Targets;

Silicom Carbide (SiC) Sputtering Targets;

Tantalum Carbide (TaC) Sputtering Targets;

Titanium Carbide(TiC) Sputtering Targets;

Titanium Carbonitride (TiCN) Sputtering Targets;

Tungsten Carbide (W2C) Sputtering Targets;

Tungsten Carbide (WC) Sputtering Targets;

Tungsten Carbide Doped with Nickel (WC+Ni);

Tungsten Carbide Doped with Cobalt (WC+Co);

Vanadium Carbide (VC) Sputtering Targets;

Zirconium Carbide(ZrC) Sputtering Targets;

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