HfN Sputtering Target

HfN Sputtering Target

Goodwill Metal Tech manufactures HfN Sputtering Targets. Our product is consistently good in quality and purity. We also makes doped targets by customer request.

Product Details

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Property: grey powder, cubic crystal structure. Melting point 3310 ℃, microhardness 16 gpa. Relatively stable, but easy to be wang shui, concentrated sulfuric acid, hydrofluoric acid corrosion. Reaction generated directly by the hafnium and nitrogen at 900 ℃, or by the hafnium halide and ammonia nitrogen and hydrogen making mixed gas reaction. Is an important component of hafnium alloy, an important refractory compound.

Product name

hafnium nitride Sulphur target

Symbol

HfN

Manfucture method

Smelting

Size

Max size 2000L×250W, Max Diameter 400mm .Special specification can be provided according to customer requirements

Densi

 13.8g/cm3

Purity

99.9% , 99.99% ,99.999%

Melting point

3305°C

Grain size

<100um

Type of Bonding

RIndium         RElastomer        RSilver Adhesive    RAgCu


Application

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Is an important component of hafnium alloy, an important refractory compound


Quality Control 

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1. Fully operate the computer information management system

The product status and production process can be checked at any time. The material coding, material shape, material location, equipment, operators, processing time and steps can be found through Lot No.

2. The operating procedures meet the requirements of ISO9001 quality system

The company implements scientific and strict management system, production process and operation procedure, and is strictly guaranteed from each link of product research and development, production and sales, and service.

3. All employees receive professional skills training and professional quality.

The company conducts regular assessment of employees' professional skills.

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