Our Titanium Aluminum sputtering target is produced by advanced thermal isostatic pressure technology, including plane target, arc target, annular target and integral shaped pipe target with large length-diameter ratio. It has the advantages of wide proportion range (10at%-90at% aluminum content), high purity and density, uniform grain size and long service life.Ti-Al-X (X=Si, Cr, Y, B, V) and other special components and specifications can also be customized according to customer requirements.
Titanium Aluminum sputtering target
HIP(hot isostatic pressure)
Max size 1500L×500W, Max Diameter 400mm .
Special specification can be provided according to customer requirements
Thermal conductivity (W/m.K)
Our company provides target products for decoration and wear-resistant corrosion function such as mobile phones, computers and other household appliances, watches, glasses, sanitary hardware and handicrafts,Cr,NiCr, Capitol,CrAl, etc., with plane target, cylinder target, arc target and circular tube target in shape, which can be coated with black, gold, silver, red and color film series.Among them, chromium target, titanium aluminum target and chromium aluminum target are produced by advanced hot isostatic pressure technology, which has the advantages of high purity and density, uniform grain size and long service life.
Our company has advanced laser particle size analyzer, powder specific surface area analyzer, metallographic microscope, scanning electron microscope, projection electron microscope, X-ray diffraction (XRD) and other professional material testing equipment, which can analyze powder particle size, particle size distribution, material metallographic structure, scanning structure, and phase structure.
Hot Isostatic Press machine,HIP;
Cold Isostatic Press machine,CIP;
Hot Pressing Furnace,HP;
Hydrogen Sintering Furnace;
Plasma Spraying Equipment;
Plasma Rotating Electrode machine, PREP;